Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE process trends: Difference between revisions
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=Some general process trends= | =Some general process trends= | ||
This page is | This page is gathering some general process trends and good advice for designing IBE recipes. So far these trends has been developed etching Si with resist as masking material and by etching some multilayered films. The work has been done by ''Kristian Hagsted Rasmussen @ nanolab before 2012'' | ||
==Etch rate== | ==Etch rate== | ||