Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions

← Older edit
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
No edit summary
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,324 edits
 
Line 45: Line 45:
Image:wf center206.jpg|Top view
Image:wf center206.jpg|Top view
Image:wf center207.jpg|Top view
Image:wf center207.jpg|Top view
</gallery>
==images 3==
<gallery caption="6A1_feb262013_step9" widths="200px" heights="150px" perrow="4">


</gallery>
</gallery>
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_oxide/By_Peixiong/images_CF4"