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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Ti etch: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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!style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity
!style="background:silver; color:black" align="left" valign="top"|Etch rate uniformity
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<+-2%
*<&plusmn;2%
|
|
*+-(0.2% +-0.2%)
*&plusmn;(0.2% &plusmn;0.2%)
|-
|-
!style="background:silver; color:black" align="left" valign="top"|Reproducibility
!style="background:silver; color:black" align="left" valign="top"|Reproducibility
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*<+-2%
*<&plusmn;2%
|
|
*+-(0.8% +-0.5%)
*&plusmn;(0.8% &plusmn;0.5%)
|-
|-
!style="background:silver; color:black" align="left" valign="top"|Selectivity (Ti etch rate/ZEP etch rate)
!style="background:silver; color:black" align="left" valign="top"|Selectivity (Ti etch rate/ZEP etch rate)
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