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''by bghe@nanolab'' experiments made in June/July 2012
''by bghe@nanolab'' experiments made in June/July 2012
<gallery caption="Some examples of blazed gratings in fused silica etched with Cr and DUV resist as masking layer "  widths="300px" heights="250px">
<gallery widths="300px" heights="250px" caption="Some examples of blazed gratings in fused silica etched with Cr and DUV resist as masking layer">
 
Image:IBE 30min -Cr1.jpg |'''30 min etch with 100 nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 400 mA<br>*RF power = 1300 W<br>*I(B) = 300 mA<br>*V(B) = 300 V<br>*V(AC,B)=500 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 5 sccm<br>*CHF3 flow = 15 sccm
Image:IBE 30min -Cr1.jpg |'''30 min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N)=400mA<br>*RF power=1300 W<br>*I(B)=300 mA<br>*V(B)=300V<br>*V(AC,B)=500 V<br>*Ar(N) flow=5sccm<br>*Ar(B) flow=5 sccm<br>*CHF3 flow=15 sccm
Image:after IBE 45min_A_34.jpg |'''45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 400 mA<br>*RF power = 1300 W<br>*I(B) = 300 mA<br>*V(B) = 300 V<br>*V(AC,B) = 500 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 5 sccm<br>*CHF3 flow = 15 sccm
Image:after IBE 45min_A_34.jpg |'''45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N)=400mA<br>*RF power=1300W<br>*I(B)=300mA<br>*V(B)=300V<br>*V(AC,B)=500V<br>*Ar(N) flow=5sccm<br>*Ar(B) flow=5sccm<br>*CHF3 flow=15sccm
Image:Edge_1.jpg|'''20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 550 mA<br>*RF power = 1300 W<br>*I(B) = 500 mA<br>*V(B) = 600 V<br>*V(AC,B) = 400 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 10 sccm<br>*CHF3 flow = 0 sccm
Image:Edge_1.jpg|'''20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N)=550mA<br>*RF power=1300W<br>*I(B)=500mA<br>*V(B)=600V<br>*V(AC,B)=400V<br>*Ar(N) flow=5sccm<br>*Ar(B) flow=10sccm<br>*CHF3 flow=0sccm
Image:15min+30min5.jpg|'''15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N) = 400 mA<br>*RF power = 1300 W<br>*I(B) = 300 mA<br>*V(B) = 300 V<br>*V(AC,B) = 500 V<br>*Ar(N) flow = 5 sccm<br>*Ar(B) flow = 5 sccm<br>*CHF3 flow = 15 sccm
Image:15min+30min5.jpg|'''15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3''' <br>*Rotation speed 0 rpm<br>*Angle: -35<br>*I(N)=400mA<br>*RF power=1300W<br>*I(B)=300mA<br>*V(B)=300V<br>*V(AC,B)=500V<br>*Ar(N) flow=5sccm<br>*Ar(B) flow=5sccm<br>*CHF3 flow=15sccm
 
</gallery>
</gallery>
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