Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions
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== Results == | == Results == | ||
Below is overview optical images of the developed pattern: | |||
[[File:Dose test optical.png|frameless|625x625px|dose test optical images|left]] | |||
Revision as of 13:31, 27 August 2025
Resist info
- we used a 10 % HSQ resist for a dose test. The resist info sheet could be found her.
- spinning: in labspin 3000rpm for 40s with 2s ramp (1500 acceleration) then bake for 2 min at 165 C
- Exposure: At 12nA ap6 (spot size 10 nm) in JEOL 9500
- Dose test with structures (3x3)
- Develop for 90s using manual TMAH developer
- Optical and SEM images and analysis
Results
Below is overview optical images of the developed pattern:
