Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions
No edit summary |
|||
| Line 1: | Line 1: | ||
= | = Resist info = | ||
* we used a 10 % HSQ resist for a dose test. The resist info sheet could be found [https://www.emresist.com/web/content/16597 her]. | |||
* spinning: in labspin 3000rpm for 40s with 2s ramp (1500 acceleration) then bake for 2 min at 165 C | |||
* Exposure: At 12nA ap6 (spot size 10 nm) in JEOL 9500 | |||
** Dose test with structures (3x3) | |||
** Develop for 90s using manual TMAH developer | |||
** Optical and SEM images and analysis | |||
== test2 == | == test2 == | ||
Revision as of 13:18, 27 August 2025
Resist info
- we used a 10 % HSQ resist for a dose test. The resist info sheet could be found her.
- spinning: in labspin 3000rpm for 40s with 2s ramp (1500 acceleration) then bake for 2 min at 165 C
- Exposure: At 12nA ap6 (spot size 10 nm) in JEOL 9500
- Dose test with structures (3x3)
- Develop for 90s using manual TMAH developer
- Optical and SEM images and analysis