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Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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'''ebimg mkref PQRef1000mu.tiff PQRef1000mu.ref.gz'''
'''ebimg mkref PQRef1000mu.tiff PQRef1000mu.ref.gz'''


This will generate the actual reference image file with the correct scaling. This file should be moved to
After entering this command a window will open, showing the reference mark with a green cross indicating the center. For a symmetric mark this green cross will be in the center. It is possible to change the center point of the mark by moving the green mark with the mouse, this could be useful if an asymmetric mark is used. However, for a symmetric mark simply press "ESC" to close the window. This will generate the actual reference image file with the correct scaling. This file should be moved to


'''/home/eb0/jeoleb/prm/mark'''
'''/home/eb0/jeoleb/prm/mark'''
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