Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions

Thope (talk | contribs)
Thope (talk | contribs)
Line 59: Line 59:
| colspan="1" style="text-align:enter;|
| colspan="1" style="text-align:enter;|
Gain settings used for image scan. Unlike the usual "Cross mark" scan type, the "SE" detector is now available for alignment.
Gain settings used for image scan. Unlike the usual "Cross mark" scan type, the "SE" detector is now available for alignment.
|}
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
|-
| [[image:2Droughscan.png|400px]] || [[image:2Dfinescan.png|400px]]
|-
| colspan="2" style="text-align:enter;|
Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system.
|}
|}