Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions
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| [[image:PQRef1000mu.png|400px]] | | [[image:PQRef1000mu.png|400px]] | ||
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Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | ||