Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions
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During alignment the system will take SEM images and compare these to reference images of the alignment marks. These reference images can in principle be SEM images obtained from the system but it is simpler to use black and white drawings of the alignment marks. In this example we will use a cross. | During alignment the system will take SEM images and compare these to reference images of the alignment marks. These reference images can in principle be SEM images obtained from the system but it is simpler to use black and white drawings of the alignment marks. In this example we will use a cross. | ||
[[ | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
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| [[image:PQRef1000mu.png|400px]] | |||
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Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | |||
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