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Specific Process Knowledge/Etch/DRIE-Pegasus/processB: Difference between revisions

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Line 32: Line 32:
! Uniformity (%)
! Uniformity (%)
| < 3.5
| < 3.5
| 3.0
| 2.7
|-
|-
! Repeatability (%)
! Repeatability (%)
Line 46: Line 46:
|+ '''Process B recipe'''
|+ '''Process B recipe'''
|-
|-
!
! colspan="2" | Step 1
! colspan="2" | Step 2
|-
|-
! width="120" | Parameter  
! width="120" | Main etch (D->E)  
! width="120" | Etch
! width="120" | Dep
! width="120" | Etch
! width="120" | Etch
! width="120" | Dep
! width="120" | Dep
|-
|-
! Gas flow (sccm)  
! Gas flow (sccm)  
| SF<sub>6</sub> 350 (1.5 s) 550
| SF<sub>6</sub> 350 O<sub>2</sub> 35
| C<sub>4</sub>F<sub>8</sub> 200
| SF<sub>6</sub> 350 (1.5 s) 550
| C<sub>4</sub>F<sub>8</sub> 200
| C<sub>4</sub>F<sub>8</sub> 200
|-
|-
! Cycle time (secs)  
! Cycle time (secs)  
| 7.0
| 4.0
| 7.0
| 7.0
| 4.0
| 4.0
|-
|-
! Pressure (mtorr)  
! Pressure (mtorr)  
| 25 (1.5 s) 90 >> 150
| 20 (1.5 s) 100
| 25
| 25 (1.5 s) 150
| 25
| 25
|-
|-
! Coil power (W)  
! Coil power (W)  
| 2800  
| 2800  
| 2000
| 2800
| 2000
| 2000
|-
|-
! Platen power (W)
! Platen power (W)
| 120 >> 140 (1.5) 45
| 130 (1.5) 40
| 0
| 0
| 140 (1.5) 45
| 0
|-
|-
! Cycles   
! Cycles   
| colspan="2" | 11 (keep fixed)
| colspan="2" | 55 (process time 10:05)
| colspan="2" | 44 (vary this)
|-
|-
! Common  
! Common  
| colspan="4" | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
| colspan="2" | Temperature 10 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
|}
|}
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