Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions
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== Introduction == | |||
In addition to alignment by beam scanning the JEOL 9500 system also has a 2D alignment feature. The working principle of this is that the system will take a SEM image of a specified location and compare the SEM image to a reference image. By comparison of these the system will determine an offset and use this for alignment. | In addition to alignment by beam scanning the JEOL 9500 system also has a 2D alignment feature. The working principle of this is that the system will take a SEM image of a specified location and compare the SEM image to a reference image. By comparison of these the system will determine an offset and use this for alignment. | ||
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The following will illustrate how to set this up. It is a bit more complicated than regular beam scan alignment and knowledge of beam scan alignment is a prerequisite for understanding the following. Please contact us if you would like to try this alignment mode rather than trying on your own. For reference, the JEOL provided manual for 2D alignment can be found here: '''[[:File:2D mark detecting 20171212.pdf]]''' | The following will illustrate how to set this up. It is a bit more complicated than regular beam scan alignment and knowledge of beam scan alignment is a prerequisite for understanding the following. Please contact us if you would like to try this alignment mode rather than trying on your own. For reference, the JEOL provided manual for 2D alignment can be found here: '''[[:File:2D mark detecting 20171212.pdf]]''' | ||
== Reference images == | |||
During alignment the system will take SEM images and compare these to reference images of the alignment marks. These reference images can in principle be SEM images obtained from the system but it is simpler to use black and white drawings of the alignment marks. In this example we will use a cross. | |||