Specific Process Knowledge/Thin film deposition/Deposition of Zinc: Difference between revisions
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More information can be found on the O-drive of the Thin film group under PVD/Thermal evaporator (for Nanolab staff only). | More information can be found on the O-drive of the Thin film group under PVD/Thermal evaporator (for Nanolab staff only). | ||
===Further lessons | ===Further lessons by Chanju Kim=== | ||
''Depositions carried out in October 2018.'' | ''Depositions carried out in October 2018.'' | ||
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It was possible to use an automatic program after some adjustments. A stable deposition rate of 0.5 Å/s was obtained with a max. power of 14.5 % after approx. 15 min of ramping and soaking. Depositions at 0.3 Å/s and 1 Å/s were not stable. The final PID parameters were P 15, I 2 and D 1. | It was possible to use an automatic program after some adjustments. A stable deposition rate of 0.5 Å/s was obtained with a max. power of 14.5 % after approx. 15 min of ramping and soaking. Depositions at 0.3 Å/s and 1 Å/s were not stable. The final PID parameters were P 15, I 2 and D 1. | ||
[[File:Zn dep rates.png|400px|left|thumb|Deposition rate versus power for four different trials with Zn deposition.]] | [[File:Zn dep rates.png|400px|left|thumb|Deposition rate versus power for four different trials with Zn deposition. Work and graph by Chanju Kim.]] | ||
It is important not to use too high power as this will give a very fast increase in the deposition rate once the evaporation is started. For new Zn pellets, an oxide removal run is recommended before the actual deposition. The max power needs to be slightly adjusted for this run (slightly higher than for already-melted pellets). | It is important not to use too high power as this will give a very fast increase in the deposition rate once the evaporation is started. For new Zn pellets, an oxide removal run is recommended before the actual deposition. The max power needs to be slightly adjusted for this run (slightly higher than for already-melted pellets). | ||