Specific Process Knowledge/Thermal Process/E1 Furnace Oxidation (8"): Difference between revisions
No edit summary |
|||
| Line 9: | Line 9: | ||
==Oxidation (8") furnace (E1)== | ==Oxidation (8") furnace (E1)== | ||
[[Image:E1_furnace.JPG|thumb|300x300px|Oxidation (8") furnace (E1). Positioned in cleanroom E-6.''Photo: DTU Nanolab internal'']] | [[Image:E1_furnace.JPG|thumb|300x300px|Oxidation (8") furnace (E1). Positioned in cleanroom E-6. ''Photo: DTU Nanolab internal'']] | ||
The Oxidation (8") furnace (E1) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. | The Oxidation (8") furnace (E1) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. | ||