Specific Process Knowledge/Thin film deposition/Deposition of Tungsten Nitride: Difference between revisions
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Beyond electronics and photonics, the material’s wear and oxidation resistance support MEMS springs, high‑temperature sensors, and corrosion‑resistant coatings, while select WN phases become superconducting below roughly 3–5 K, enabling niche low‑loss microwave resonators and detector elements that benefit from its mechanical robustness and diffusion‑barrier capability. | Beyond electronics and photonics, the material’s wear and oxidation resistance support MEMS springs, high‑temperature sensors, and corrosion‑resistant coatings, while select WN phases become superconducting below roughly 3–5 K, enabling niche low‑loss microwave resonators and detector elements that benefit from its mechanical robustness and diffusion‑barrier capability. | ||
== Deposition of | == Deposition of Tungsten Nitride == | ||
Deposition of WN can only be done by reactive sputtering using W target. | Deposition of WN can only be done by reactive sputtering using W target. | ||