Specific Process Knowledge/Thin film deposition/Deposition of Tungsten Nitride: Difference between revisions
Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium_Nitride&action=submit click here]''' =Tungsten Nitride (WN<sub>x</sub>)= Scandium nitride (ScN) is a rocksalt‑structure semiconductor with an indirect bandgap near 0.9 eV and a direct transition around 2.1 eV, combining high..." |
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tungsten_Nitride&action=submit click here]''' | ||
=Tungsten Nitride (WN<sub>x</sub>)= | =Tungsten Nitride (WN<sub>x</sub>)= | ||