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Specific Process Knowledge/Thin film deposition/Deposition of NbTi: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
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!Stoichiometry
!Stoichiometry
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*NbTi (Sputter-System Metal-Nitride(PC3))
*NbTi (Sputter-System Metal-Nitride(PC3)) NbTi 67/33 At.% (4" target)
NbTi 67/33 At.% (4" target)
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*Unknown
*Unknown
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