Specific Process Knowledge/Thin film deposition/Deposition of NbTi: Difference between revisions
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*NbTi (Sputter-System Metal-Nitride(PC3)) | *NbTi (Sputter-System Metal-Nitride(PC3)) | ||
NbTi 67/33 At.% (4" target) | NbTi 67/33 At.% (4" target) | ||
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*Unknown | *Unknown | ||
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*Limited by process time. | *Limited by process time. | ||
*Deposition rate (0. | *Deposition rate (0.6 nm/s) is likely faster than Sputter-System (Lesker) | ||
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