Specific Process Knowledge/Thin film deposition/Deposition of Tantalum: Difference between revisions
| Line 65: | Line 65: | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
! Deposition rate | ! Deposition rate | ||
|0.5Å/s to | |0.5Å/s to 1Å/s | ||
|~0.3Å/s | |~0.3Å/s | ||
|at least in the range 1 Å/s to 4 Å/s | |at least in the range 1 Å/s to 4 Å/s | ||