Specific Process Knowledge/Thin film deposition/Deposition of ITO: Difference between revisions

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+=Indium tin oxide (ITO)=
+Indium tin oxide (ITO) is the canonical degenerate n‑type transparent conducting oxide, combining high visible transmittance with low sheet resistance and a mature, scalable manufacturing base.
+It is deposited industrially by magnetron sputtering for uniform, low-resistivity films. ITO is the workhorse transparent electrode for displays and touch panels, OLED/LED emitters, and a wide range of photovoltaic technologies; oxygen stoichiometry is tuned to balance conductivity and transparency.
+In photonics, heavily doped ITO exhibits an epsilon-near-zero response in the near-infrared (around the 1.55 µm telecom band), enabling compact electro-optic modulators, plasmonic waveguides, and absorbers, as well as strong nonlinear/ultrafast effects.
+ITO can also become superconducting at cryogenic temperatures when strongly reduced or ion-intercalated, with reported critical temperatures ranging from sub-kelvin to a few kelvin, depending on the carrier density and processing.
+Beyond semiconductors and optics, ITO supports transparent heaters, low-emissivity and EMI-shielding window coatings, and ENZ-enabled NIR photodetectors. When even lower resistance is required, it is often paired with ultrathin metals in hybrid stacks, while retaining high transparency.
 ==Deposition of ITO==