Specific Process Knowledge/Thin film deposition/Deposition of AZO: Difference between revisions

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 =AZO deposition=
-AZO can be deposited by sputtering or atomic layer deposition (ALD). In sputter-deposition of AZO, we use an AZO target that may be RF-sputtered or reactively DC-sputtered. You can also co-deposit Al and ZnO. Note that in multipurpose sputter systems such as ours it may be difficult to obtain low enough contamination for high-quality AZO. Talk to Nanolab staff or your colleagues if you would like to locate a sputter system that can be dedicated to AZO-deposition.
+AZO can be deposited by RF, reactive RF, reactive DC, or reactive p-DC sputtering or atomic layer deposition (ALD). In the sputter deposition of AZO, an AZO target is used that may be RF-sputtered with or without adding additional oxygen, or reactively DC- or p-DC-sputtered. Elevated temperatures of 200 °C are typically employed. You can also co-deposit Al and ZnO, although it is usually not the most recommended approach. Note that in multipurpose sputter systems, such as ours, it may be challenging to achieve sufficiently low contamination for high-quality AZO. Contact Nanolab staff or your colleagues if you would like to locate a sputter system dedicated to AZO deposition.
-In the chart below you can compare the different deposition equipment available here at Nanolab:
+Atomic Layer deposition is a well-known method, where high uniformity coverage (aspect ratio over 100) can be achieved.
+In the chart below, you can compare the different deposition equipment available here at Nanolab: