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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride: Difference between revisions

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*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Sputter-System Metal-Oxide (PC1)|TiN deposition with reactive sputtering using Sputter-System Metal-Oxide (PC1)]].
*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Sputter-System Metal-Oxide (PC1)|TiN deposition with reactive sputtering using Sputter-System Metal-Oxide (PC1)]].
*[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride/Deposition of Titanium Nitride using Sputter-System Metal-Nitride (PC3)|TiN deposition with reactive sputtering using Sputter-System Metal-Nitride (PC3)]] - preferable option.


==Comparison between sputtering and ALD methods for deposition of Titanium Nitride.==
==Comparison between sputtering and ALD methods for deposition of Titanium Nitride.==
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