Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride: Difference between revisions
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==Atomic Layer Deposition of Aluminium Nitride (AlN)== | ==Atomic Layer Deposition of Aluminium Nitride (AlN)== | ||
Aluminium Nitride (AlN) can be deposited using the plasma-enhanced atomic layer deposition method from TMA and NH3 precursors. The process is well known, and the following link describes all the details: | |||
*[[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/AlN deposition using ALD2|AlN deposition using ALD2]] | *[[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/AlN deposition using ALD2|AlN deposition using ALD2]] | ||