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== Deposition of Aluminium Nitride ==
== Deposition of Aluminium Nitride ==


AlN films can be deposited by sputtering or by atomic layer deposition (ALD).
AlN films can be deposited by reactive sputtering or by atomic layer deposition (ALD).


In the sputter systems AlN can be either deposited by direct sputtering of an AlN target or reactive sputtering with an Al target in mixtures of argon and nitrogen.
In sputter systems, AlN can be deposited either by direct sputtering of an AlN target or by reactive sputtering with an Al target in a mixture of argon and nitrogen.


==Comparison of the methods for deposition of AlN==
==Comparison of the methods for deposition of AlN==