Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride: Difference between revisions
Appearance
No edit summary |
|||
| Line 7: | Line 7: | ||
== Deposition of Aluminium Nitride == | == Deposition of Aluminium Nitride == | ||
AlN films can be deposited by sputtering or by atomic layer deposition (ALD). | AlN films can be deposited by reactive sputtering or by atomic layer deposition (ALD). | ||
In | In sputter systems, AlN can be deposited either by direct sputtering of an AlN target or by reactive sputtering with an Al target in a mixture of argon and nitrogen. | ||
==Comparison of the methods for deposition of AlN== | ==Comparison of the methods for deposition of AlN== | ||