Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Silicon Nitride Etch: Difference between revisions

Revision as of 13:17, 28 July 2025 view source Prakus (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 156 edits →Etch rate uniformity & etch rate ← Older edit		Revision as of 13:18, 28 July 2025 view source Prakus (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 156 edits →Etch rate uniformity & etch rate Newer edit →
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	<nowiki>*</nowiki>The process was repeated twice, but only one set of data is presented here.<br>		<nowiki>*</nowiki>The process was repeated twice, but only one set of data is presented here.<br>