Specific Process Knowledge/Thermal Process: Difference between revisions
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*[[/A4 Furnace Phosphorus pre-dep|A4 Furnace Phosphorus pre-dep]] - ''Dope with Phosphorus: For predeposition of Phosphorus on wafers'' | *[[/A4 Furnace Phosphorus pre-dep|A4 Furnace Phosphorus pre-dep]] - ''Dope with Phosphorus: For predeposition of Phosphorus on wafers'' | ||
*[[/C1 Furnace Anneal Oxide|C1 Furnace Anneal Oxide]] - ''For oxidation and annealing'' | *[[/C1 Furnace Anneal Oxide|C1 Furnace Anneal Oxide]] - ''For oxidation and annealing'' | ||
*[[/ | *[[/C1 Furnace Gate Oxide|C2 Furnace Gate Oxide]] - ''For growing of Gate Oxide on new wafers'' | ||
*[[/C3 Furnace Anneal Bond|C3 Furnace Anneal Bond]] - ''For annealing of bonded wafers and?? '' | *[[/C3 Furnace Anneal Bond|C3 Furnace Anneal Bond]] - ''For annealing of bonded wafers and?? '' | ||
*[[/C4 Furnace Aluminium Anneal|C4 Furnace Aluminium Anneal]] - ''For oxidation and annealing of wafers containing Aluminium'' | *[[/C4 Furnace Aluminium Anneal|C4 Furnace Aluminium Anneal]] - ''For oxidation and annealing of wafers containing Aluminium'' | ||