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Dektak XTA (Stylus Profiler)

The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.

A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. Stress measurements of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the P17 profiler.

The user manual, quality control procedure and results, technical information and contact information can be found in LabManager.

Information on measurement accuracy and reproducibility for the stylus profilers may be found here

Performance and Process Parameters

Purpose	Profiler for measuring micro structures	Single line profiles Wafer mapping Stress measurements by measuring wafer bow Surface roughness on a line scan
Performance	Scan range x y	Line scan: 50 µm to 55 mm in a single scan Up to 200 mm with stiching
	Scan range z	50 Å to 1 mm
	Resolution x y	Down to 0.003 µm theoretically, in practice limited by tip radius
	Resolution z	1 Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively
	Height accuracy z (95 % confidence)	~ 2 % for a 1 µm step with the 65 kÅ range ~ 1 % for a 25 µm step for well-defined steps that are easy to measure. More info here
	Max scan depth as a function of trench width W	1.2*(W[µm]-5µm)
Hardware settings	Tip radius	5 µm 45^o cone
Substrates	Substrate size	Up to 6"
	Substrate materials allowed	All materials that do not stick to the tip or leave residues For very soft polymers we recommend the Dektak 150.

@@ Line 33: / Line 33: @@
 |style="background:LightGrey; color:black"|Scan range x y
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-Line scan x: 50 µm to 55 mm in a single scan, up to 200 mm with stiching
+* Line scan: 50 µm to 55 mm in a single scan
+* Up to 200 mm with stiching
 |-
 |style="background:LightGrey; color:black"|Scan range z
@@ Line 41: / Line 42: @@
 |style="background:LightGrey; color:black"|Resolution x y
 |style="background:WhiteSmoke; color:black"|
-Down to 0.003 µm theoretically, in practice limited by the tip radius
+Down to 0.003 µm theoretically, in practice limited by tip radius
 |-
 |style="background:LightGrey; color:black"|Resolution z
 |style="background:WhiteSmoke; color:black"|
-Å, 10 Å, 80 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively)
+Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively
 |-
 |style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
 |style="background:WhiteSmoke; color:black"|
-~ 2 % for a 1 µm step with the smallest measurement range and ~ 1 % for a 25 µm step ''for well-defined steps that are easy to measure.'' [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|More info here]]
+*~ 2 % for a 1 µm step with the 65 kÅ range
+*~ 1 % for a 25 µm step
+*''for well-defined steps that are easy to measure.''
+*[[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|More info here]]
 |-
 |style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
@@ Line 68: / Line 72: @@
 | style="background:LightGrey; color:black"|Substrate materials allowed
 |style="background:WhiteSmoke; color:black"|
-*All materials that do not stick to the tip or leave residues on the chuck
+*All materials that do not stick to the tip or leave residues
 *For very soft polymers we recommend the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab| Dektak 150]].
 |-
 |}