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The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers.
=Standard Oxidation Recipes=


On this page the steps in the standard oxidation recipes on the furnaces will be listed.  
The oxidation furnaces in the cleanroom are being used for dry and wet oxidation of silicon wafers. On this page the steps in the standard oxidation recipes on the furnaces will be listed.  


===Dry oxidation can be done in the these furnaces:===
'''Dry oxidation can be done in following furnaces:'''


*A1 Boron Drive-in and Pre-dep furnace  
*A1 Boron Drive-in and Pre-dep furnace  
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*C3 Anneal-Bond furnace  
*C3 Anneal-Bond furnace  
*Multipurpose Anneal furnace
*Multipurpose Anneal furnace
 
<br>
The dry oxidation recipes in the A- and C-stack furnaces are very similar and will be described on this page.  
The dry oxidation recipes in the A- and C-stack furnaces are very similar and will be described on this page.  


There are no standard recipes on the Multipurpose Anneal furnace, so no oxidation recipes will be described here.  
There are no standard recipes on the Multipurpose Anneal furnace, so no oxidation recipes will be described here.  
 
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<br>
===Wet oxidation can be done in these furnaces:===
'''Wet oxidation can be done in these furnaces:'''


*A1 Boron Drive-in and Pre-dep furnace  
*A1 Boron Drive-in and Pre-dep furnace  
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However, there are a few differences in recipes, because water vapour can be generated by either a torch, a steamer or a bubbler. More information can be found on each furnace page.
However, there are a few differences in recipes, because water vapour can be generated by either a torch, a steamer or a bubbler. More information can be found on each furnace page.
 
<br>
Wet oxidation of III-V sample in the C2 furnace is described here:
<br>
 
'''General Remarks for Oxidation Recipes:'''
http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/Oxidation/Oxidation_on_III-V_oxidation_furnace_(C2)
 
===General recipe remarks:===


The oxidation temperature is fixed in each recipe. The temperature can be seen in the recipe name, e.g. "DRY1000" for dry oxidation at 1000 C and "WET1100" for wet oxidation at 1100 C.  
The oxidation temperature is fixed in each recipe. The temperature can be seen in the recipe name, e.g. "DRY1000" for dry oxidation at 1000 C and "WET1100" for wet oxidation at 1100 C.  
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The annealing improves... The standard annealing time is 20 minutes, but it is possible to change the time.  
The annealing improves... The standard annealing time is 20 minutes, but it is possible to change the time.  
 
<br><br>
 
==Dry Oxidation Process Steps==
 
 
 
 
 
==Dry oxidation recipe steps==


'''00 STANDBY'''
'''00 STANDBY'''
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