Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
mNo edit summary |
|||
| Line 3: | Line 3: | ||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | ||
[[ | [[Category:Equipment|Thin film PECVD]] | ||
[[ | [[Category:Thin Film Deposition|PECVD]] | ||
==PECVD Plasma Enhanced Chemical Vapor Deposition== | ==PECVD Plasma Enhanced Chemical Vapor Deposition== | ||