Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
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==Process information== | ==Process information== | ||
*[[ | *[[/Standard recipes, QC limits and results for the 4" polysilicon furnace|Deposition of polysilicon using the 4" polysilicon furnace]] | ||
*[[/Boron doped poly-Si and a-Si |Boron doped poly-Si and a-Si by using 4" polysilicon furnace]] | *[[/Boron doped poly-Si and a-Si |Boron doped poly-Si and a-Si by using 4" polysilicon furnace]] | ||
*[[ | *[[/Standard recipes, QC limits and results for the 6" polysilicon furnace|Deposition of polysilicon using the 6" polysilicon furnace]] | ||
*[[/Boron doped poly-Si |Boron doped poly-Si using 6" polysilicon furnace]] | *[[/Boron doped poly-Si |Boron doped poly-Si using 6" polysilicon furnace]] | ||
==Overview of the performance of the LPCVD polysilicon processes and some process related parameters== | ==Overview of the performance of the LPCVD polysilicon processes and some process related parameters== | ||