Specific Process Knowledge/Etch/RIE (Reactive Ion Etch): Difference between revisions
mNo edit summary |
mNo edit summary |
||
| Line 1: | Line 1: | ||
[[Category: Equipment |Etch RIE]] | [[Category: Equipment |Etch RIE]] | ||
[[Category: Etch (Dry) Equipment |RIE]] | [[Category: Etch (Dry) Equipment |RIE]] | ||
<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned. </span> | <span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned. </span> | ||