Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum: Difference between revisions

← Older editNewer edit →
VisualWikitext
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
Line 36: Line 36:
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
! Deposition rate
! Deposition rate
|1Å/s to 10Å/s
| 1Å/s to 10Å/s
| Depends on process parameters, roughly about 1 Å/s
| Depends on process parameters, roughly about 1 Å/s
| Not known yet, probably similar to 'old' Lesker sputter system
| At least up to 4 Å/s. See process log.
|-
|-
|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Molybdenum"