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Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum: Difference between revisions

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|-style="background:WhiteSmoke; color:black"
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! Comment
! Comment
| As of June 2023, Mo has not yet been deposited in the Temescal.
|  
Please contact the Thin Film group to develop a process.
| Sputter target size 2".
| Sputter target size 2".
| Sputter target size 3-4" (usually 3"). As of June 2023, Mo has not yet been deposited in the 'new' Lesker sputter chambers.  
| Sputter target size 3-4" (usually 3"). So far (June 2025) Mo has been deposited in PC1. See process log for details.
Please contact the Thin Film group to develop a process.
|-
|-


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