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Specific Process Knowledge/Thin film deposition/thermalevaporator: Difference between revisions

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!style="background:silver; color:black" align="left" valign="top" rowspan="5"|Performance
!style="background:silver; color:black" align="left" valign="top" rowspan="5"|Performance
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
*10Å - 1µm (Al and Ag)
*10Å - 1µm (Al)
*10Å - 0.5µm (Ag)
*up to 100 nm (Cr) (ask if you wish to deposit more)
*up to 100 nm (Cr) (ask if you wish to deposit more)
*for other metals ask if in doubt
*ask if in doubt or if you wish to exceed the limits
|-
|-
|style="background:LightGrey; color:black"|Deposition rate
|style="background:LightGrey; color:black"|Deposition rate
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