Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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*fast RF power supply | *fast RF power supply | ||
the etch and deposition cycles may be split into three separate phases, called Delay, Boost and Main. | the etch and deposition cycles may be split into three separate phases, called Delay, Boost and Main. | ||
[[Image:boostdelay4b.jpg |300x300px|thumb|The etch cycle is split into three parts: Boost, Delay and Main]] | |||
===[[Advanced_Silicon_Etcher_-_Pegasus|Details on DRIE-Pegasus]]=== | ===[[Advanced_Silicon_Etcher_-_Pegasus|Details on DRIE-Pegasus]]=== | ||