Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
Appearance
No edit summary |
|||
| Line 35: | Line 35: | ||
| | | | ||
*Photoresist | *Photoresist | ||
*E-beam resist | |||
*Silicon Oxide | *Silicon Oxide | ||
*Silicon Nitride | *Silicon Nitride | ||
No edit summary |
|||
| Line 35: | Line 35: | ||
| | | | ||
*Photoresist | *Photoresist | ||
*E-beam resist | |||
*Silicon Oxide | *Silicon Oxide | ||
*Silicon Nitride | *Silicon Nitride | ||