Specific Process Knowledge/Pattern Design: Difference between revisions
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== Mask Design for UV-lithography == | == Mask Design for UV-lithography == | ||
Here you can find tips and tricks for mask designing. | Here you can find tips and tricks for mask designing. | ||
* [[ | * [[Media:Beginners guide to mask design using Clewin v1.4.pdf|"Beginners guide to mask design"]]. This is a guide how to design a set of mask. | ||
* [[ | * [[Media:Guide to mask making.pdf| Guide to mask making.pdf]]. Unfortunately this is quite old guide to mask design, but may be useful anyway. Note some links/e-mails etc. are not correct anymore and the mask specifications (CU/CD, DF/BF, RR/WR) are no longer valid. | ||
* [[ | * [[Media:Mask polarity and orientation.pdf| Mask polarity and orientation.pdf]]. This is an short guide how to specify the polarity and orientation of the mask when ordering as well as when used on our maskless aligners. Be aware that the specification of polarity and orientation when ordering at Compugraphics is not the same as when ordering at Delta Mask as we used to do. | ||
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===Alignment marks=== | ===Alignment marks=== | ||
The following alignment marks are suggested to use on the Mask aligners for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | The following alignment marks are suggested to use on the Mask aligners for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | ||
*Mask aligner: | *Mask aligner: | ||
**[[ | **[[Media:Alignmentkeys1.cif|Alignment marks 1 (.cif)]] (Right click and Use "save link as...") - ''You need the program "Clewin" to open this file'' | ||
**[[ | **[[Media:Alignmentkeys1.tdb|Alignment marks 1 (.tdb)]] - ''You need the program "L-Edit" to open this file'' | ||
*Maskless aligner: | *Maskless aligner: | ||
**[[ | **[[Media:MLA AlignmentMarks simple.gds|Simple alignment marks (.gds)]] | ||
**[[ | **[[Media:MLA alignmentMarks arrows.gds|Alignment marks with structures to assist in locating the marks during alignment (.gds)]] | ||
**[[ | **[[Media:AlignmentMark KOH.gds|Alignment mark for multiple layers, Layer 1 for etch in KOH (.gds)]] | ||
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=== Helpful information for chip layout === | === Helpful information for chip layout === | ||
*[[ | *[[Media:Gamma coater & developer chucks + hotplate pins.gds|Gamma coater & developer chucks + hotplate pins.gds]] Design file showing the size of the chucks and the position of the hotplate pins in the Gamma tools. | ||
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