Specific Process Knowledge/Pattern Design/Mask Specifications: Difference between revisions
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== 5" masks == | == 5" masks == | ||
All Layers: | All Layers: | ||
: 5" chromium mask | |||
: fracture limits ((-50000, -50000),(50000, 50000)) | |||
: Dark periphery | |||
: Chromium down | |||
GDS-file: GLO006_v7.gds | GDS-file: GLO006_v7.gds | ||
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Mask Type: Digitised data= Clear, Wrong reading | Mask Type: Digitised data= Clear, Wrong reading | ||
Text(max 30 characters): init-2019-KOH-backside | Text(max 30 characters): init-2019-KOH-backside | ||
== For 7" masks == | == For 7" masks == | ||
Revision as of 17:26, 27 May 2025
Mask Specifications
Below you can find two examples on how to write the specification for 5" and 7" masks.
5" masks
All Layers:
- 5" chromium mask
- fracture limits ((-50000, -50000),(50000, 50000))
- Dark periphery
- Chromium down
GDS-file: GLO006_v7.gds Top cell: wafer
Layer (GDS number): 01 Mask Type: Digitised data= Dark, right reading Text(max 30 characters): init-2019-Nitride-etch
Layer (GDS number): 02 Mask Type: Digitised data= Clear, Wrong reading Text(max 30 characters): init-2019-KOH-backside
For 7" masks
All Layers: 7" chromium mask fracture limits ((-70000, -70000),(70000, 70000)) Dark periphery Chromium down
GDS-file: GLO006_v7.gds Top cell: wafer
Layer (GDS number): 01 Mask Type: Digitised data= Dark, right reading Text(max 30 characters): init-2019-Nitride-etch
Layer (GDS number): 02 Mask Type: Digitised data= Clear, Wrong reading Text(max 30 characters): init-2019-KOH-backside