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=== Examples for Information relevant to a Specific Process Step ===
=== Examples for Information relevant to a Specific Process Step ===
Please find below some examples that might help you to create a complete process step. If you need assistance, feel free to contact training@nanolab.dtu.dk.
Please find below some examples that might help you to create a complete process step. If you need assistance, do not hesitate to contact our [mailto:training@nanolab.dtu.dk Fabrication Support Team].
   
   
'''Create a Mask on your Sample (Photolithography Step)'''
'''Create a Mask on your Sample (Photolithography Step)'''
** Specify the design/mask-name, -layers, and polarity used for each photolithography step
* Specify the design/mask-name, -layers, and polarity used for each photolithography step
** Specify if required and type of alignment (frontside, backside), and if relevant note down alignment marks coordinates
* Specify if required and type of alignment (frontside, backside), and if relevant note down alignment marks coordinates
** Specify resist and resist thickness (defines spin process)
* Specify resist and resist thickness (defines spin process)
** Specify developer
* Specify developer
** Specify Spin Coating equipment and process (depending on resist type and thickness)
* Specify Spin Coating equipment and process (depending on resist type and thickness)
** Specify Aligner equipment and process including exposure conditions (f.ex. exposure dose)
* Specify Aligner equipment and process including exposure conditions (f.ex. exposure dose)
** Specify Developer equipment and process (depending on resist type and thickness)
* Specify Developer equipment and process (depending on resist type and thickness)
** Define tolerance or other inspection criteria
* Define tolerance or other inspection criteria
** Check cross-contamination with pre- and post process equipment
* Check cross-contamination with pre- and post process equipment
*<u>f.ex. Metal Evaporation</u>
 
**Specify metal thicknesses, and deposition rate
'''Create a Thin Film on your Sample (Metal Evaporation)'''
**Specify Evaporator equipment, process name
*Specify metal thicknesses, and deposition rate
**Define tolerance or other inspection criteria
*Specify Evaporator equipment, process name
**Check cross-contamination with pre- and post process equipment
*Define tolerance or other inspection criteria
* <u>f.ex. Dry etching</u>
*Check cross-contamination with pre- and post process equipment
** Specify Etching Tool
 
** Specify process name, etch parameters, etch depth
'''Etch your pattern into the Substrate (Dry etching)
** Define tolerance or other inspection criteria
* Specify Etching Tool
** Check cross-contamination with pre- and post process equipment
* Specify process name, etch parameters, etch depth
<br>
* Define tolerance or other inspection criteria
* Check cross-contamination with pre- and post process equipment


== Characterization ==
== Characterization ==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Process_Flow"