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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

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Bureaucrats, danchip, Administrators
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Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
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{| {{table}} align="left"
{| {{table}} align="left"
|+ nano1.42 on the Pegasus
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
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|}
|}
{| {{table}} align="center"
{| {{table}} align="center"
|+ pxnano2 on the ASE
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
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