Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

@@ Line 100: / Line 100: @@
 | zep||nm/min||||||||||||66||
 |-
-| ||||||||||||||||
+|
-|-
+|}
-| Nominal trench line width||||30||60||90||120||150||Average||Std. dev.
+{| {{table}}
+| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
+| align="center" style="background:#f0f0f0;"|''''''
+| align="center" style="background:#f0f0f0;"|'''30'''
+| align="center" style="background:#f0f0f0;"|'''60'''
+| align="center" style="background:#f0f0f0;"|'''90'''
+| align="center" style="background:#f0f0f0;"|'''120'''
+| align="center" style="background:#f0f0f0;"|'''150'''
+| align="center" style="background:#f0f0f0;"|'''Average'''
+| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
 |-
 | Etch rates||nm/min||215||232||240||243||244||235||12