Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
| Line 9: | Line 9: | ||
! colspan="2"| Tool | ! colspan="2"| Tool | ||
| Pegasus | | Pegasus | ||
| colspan="2" | ASE | | colspan="2" align="center"| ASE | ||
|- | |- | ||
! rowspan="6" align="center"| Parameters | ! rowspan="6" align="center"| Parameters | ||
| Line 45: | Line 45: | ||
| Conditioning | | Conditioning | ||
| Sequence: Oxygen clean, MU tests, processes, no oxygen between runs | | Sequence: Oxygen clean, MU tests, processes, no oxygen between runs | ||
| colspan="2" | none | |||
|- | |- | ||
| Mask | | Mask | ||
| 211 nm zep etched down to | | 211 nm zep etched down to 80 nm | ||
| colspan="2" | 211 nm zep etched down to 130 nm | |||
|- | |- | ||
|} | |} | ||