Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
| Line 3: | Line 3: | ||
{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
|- | |- | ||
! colspan="2" | | ! colspan="2" | Recipe | ||
! nano1.42 | ! nano1.42 | ||
! pxnano2 | ! pxnano2 | ||
| Line 12: | Line 12: | ||
| ASE | | ASE | ||
|- | |- | ||
! rowspan="6" align="center"| | ! rowspan="6" align="center"| Parameters | ||
| Gas | | Gas | ||
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | ||