Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions

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 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_Film_deposition/ALD/TiO2_deposition_using_ALD click here]'''
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 The ALD window for titanium dioxide (TiO<sub>2</sub>) ranges from 120 <sup>o</sup>C to 350 <sup>o</sup>C.
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-Evgeniy Shkondin, DTU Danchip, April-May 2014.
+Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), April-May 2014.
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-Evgeniy Shkondin, DTU Danchip, 2014.
+Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014.