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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers click here]'''   
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''This page is written by DTU Nanolab internal''
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This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.
This page describes non-standart recipes including multilayers structures. They were the first test recipes on the ALD-1 to test the tool functionality and can be used as inspiration.
 
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==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==
==Low temperature deposition of Al<sub>2</sub>O<sub>3</sub>==


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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>
<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>
<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
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<b>Evgeniy Shkondin, DTU Danchip, 2014-2016.</b>
<b>Evgeniy Shkondin, DTU Nanolab (former DTU Danchip), 2014-2016.</b>
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