Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

Revision as of 10:09, 23 May 2011 view source Jml (talk \| contribs) Bureaucrats, danchip, Administrators 1,918 edits →nano1.42 versus pxnano2 ← Older edit		Revision as of 11:23, 23 May 2011 view source Jml (talk \| contribs) Bureaucrats, danchip, Administrators 1,918 edits →nano1.42 versus pxnano2 Newer edit →
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	<gallery caption="The results" widths="~~350~~" heights="300" perrow="2">		<gallery caption="The results" widths="400" heights="300" perrow="2">

	image:WF_2E09a_mar23_2011-030.jpg\|The 30 nm trenches etched 120 seconds nano1.42		image:WF_2E09a_mar23_2011-030.jpg\|The 30 nm trenches etched 120 seconds nano1.42