Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
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{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
|+ ''' | |+ '''Recipe nano1.42''' | ||
|- | |- | ||
! rowspan="6" align="center"| Recipe | ! rowspan="6" align="center"| Recipe | ||
| Gas | | Gas | ||
| | | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | ||
|- | |- | ||
| Pressure | | Pressure | ||
| | | 4 mTorr, Strike 3 secs @ 15 mTorr | ||
|- | |- | ||
| Power | | Power | ||
| | | 800 W CP, 40 W PP | ||
|- | |- | ||
| Temperature | | Temperature | ||
| | | -20 degs | ||
|- | |- | ||
| Hardware | | Hardware | ||
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|- | |- | ||
| Time | | Time | ||
| | | 120 secs | ||
|- | |- | ||
! rowspan=" | ! rowspan="3" align="center"| Conditions | ||
| Run ID | | Run ID | ||
| | | 2017 | ||
|- | |- | ||
| Conditioning | | Conditioning | ||
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|- | |- | ||
| Mask | | Mask | ||
| | | 211 nm zep etched down to 82 nm | ||
|- | |- | ||
|} | |} | ||
<gallery caption="The results" widths="350" heights="300" perrow="2"> | <gallery caption="The results" widths="350" heights="300" perrow="2"> | ||