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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

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Bureaucrats, danchip, Administrators
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Bureaucrats, danchip, Administrators
1,918 edits
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image:WF_2E09b_mar23_2011-060.jpg|The 60 nm trenches etched 96 seconds
image:WF_2E09b_mar23_2011-060.jpg|The 60 nm trenches etched 96 seconds


image:WF_2E09a_mar23_2011-060.jpg|The 90 nm trenches etched 120 seconds
image:WF_2E09a_mar23_2011-090.jpg|The 90 nm trenches etched 120 seconds
image:WF_2E09b_mar23_2011-090.jpg|The 90 nm trenches etched 96 seconds
image:WF_2E09b_mar23_2011-090.jpg|The 90 nm trenches etched 96 seconds


image:WF_2E09a_mar23_2011-060.jpg|The 120 nm trenches etched 120 seconds
image:WF_2E09a_mar23_2011-120.jpg|The 120 nm trenches etched 120 seconds
image:WF_2E09b_mar23_2011-120.jpg|The 120 nm trenches etched 96 seconds
image:WF_2E09b_mar23_2011-120.jpg|The 120 nm trenches etched 96 seconds


image:WF_2E09a_mar23_2011-060.jpg|The 150 nm trenches etched 120 seconds
image:WF_2E09a_mar23_2011-150.jpg|The 150 nm trenches etched 120 seconds
image:WF_2E09b_mar23_2011-150.jpg|The 150 nm trenches etched 96 seconds
image:WF_2E09b_mar23_2011-150.jpg|The 150 nm trenches etched 96 seconds


</gallery>
</gallery>
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