Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
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<gallery caption="The results" widths=" | <gallery caption="The results" widths="350" perrow="2"> | ||
image:WF_2E09a_mar23_2011-030.jpg|The 30 nm trenches etched 120 seconds | |||
image:WF_2E09a_mar23_2011-030.jpg|The 30 nm trenches etched 120 seconds nano1.42 | |||
image:WF_2E09b_mar23_2011-030.jpg|The 30 nm trenches etched 96 seconds pxnano2 | |||
image:WF_2E09a_mar23_2011-060.jpg|The 60 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-060.jpg|The 60 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-060.jpg|The 60 nm trenches etched 96 seconds | |||
image:WF_2E09a_mar23_2011-060.jpg|The 90 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-060.jpg|The 90 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-090.jpg|The 90 nm trenches etched 96 seconds | |||
image:WF_2E09a_mar23_2011-060.jpg|The 120 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-060.jpg|The 120 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-120.jpg|The 120 nm trenches etched 96 seconds | |||
image:WF_2E09a_mar23_2011-060.jpg|The 150 nm trenches etched 120 seconds | image:WF_2E09a_mar23_2011-060.jpg|The 150 nm trenches etched 120 seconds | ||
image:WF_2E09b_mar23_2011-150.jpg|The 150 nm trenches etched 96 seconds | |||
</gallery> | </gallery> | ||