Specific Process Knowledge/Cross Contamination: Difference between revisions
| Line 106: | Line 106: | ||
* Does the tool contaminate your sample during processing? ([[image:xcplus.png|15px|frameless|link=]] '''"Out +"''') | * Does the tool contaminate your sample during processing? ([[image:xcplus.png|15px|frameless|link=]] '''"Out +"''') | ||
* Does the tool remove a particular attribute from your sample during processing? ([[image:xcminus.png|15px|frameless|link=]] '''"Out -"''') | * Does the tool remove a particular attribute from your sample during processing? ([[image:xcminus.png|15px|frameless|link=]] '''"Out -"''') | ||
<br> | * Are there process dependent changes of attributes?([[image:xccaution.png|15px|frameless|link=]] '''added or removed traces''') | ||
<br> | |||
As you can see from the screenshot above, you are not allowed to process a sample in the "Si Etch 1: KOH" bath (our cleanest KOH etch bath) that has been previously processed in "PECVD03". Your sample might have picked up traces of material list 3, f.ex. silver, gold, or copper during processing in the PECVD03. Since those contaminants can alter the etching process and further contaminate samples processed in "Si Etch 1: KOH", they are forbidden. | As you can see from the screenshot above, you are not allowed to process a sample in the "Si Etch 1: KOH" bath (our cleanest KOH etch bath) that has been previously processed in "PECVD03". Your sample might have picked up traces of material list 3, f.ex. silver, gold, or copper during processing in the PECVD03. Since those contaminants can alter the etching process and further contaminate samples processed in "Si Etch 1: KOH", they are forbidden. | ||